A Robust Highly Aligned DNA Nanowire Array-Enabled Lithography for Graphene Nanoribbon Transistors

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• 作者：Seok Hee Kang ; Wan Sik Hwang ; Zhiqun Lin ; Se Hun Kwon ; Suck Won Hong
• 刊名：Nano Letters
• 出版年：2015
• 出版时间：December 9, 2015
• 年：2015
• 卷：15
• 期：12
• 页码：7913-7920
• 全文大小：531K
• ISSN：1530-6992

文摘

Because of its excellent charge carrier mobility at the Dirac point, graphene possesses exceptional properties for high-performance devices. Of particular interest is the potential use of graphene nanoribbons or graphene nanomesh for field-effect transistors. Herein, highly aligned DNA nanowire arrays were crafted by flow-assisted self-assembly of a drop of DNA aqueous solution on a flat polymer substrate. Subsequently, they were exploited as 鈥渋nk鈥?and transfer-printed on chemical vapor deposited (CVD)-grown graphene substrate. The oriented DNA nanowires served as the lithographic resist for selective removal of graphene, forming highly aligned graphene nanoribbons. Intriguingly, these graphene nanoribbons can be readily produced over a large area (i.e., millimeter scale) with a high degree of feature-size controllability and a low level of defects, rendering the fabrication of flexible two terminal devices and field-effect transistors.