文摘
The N-type semiconducting polymer, P(NDI2OD-T2), with different molecular weights (MW = 23, 72, and 250 kg/mol) was used for the fabrication of field-effect transistors (FETs) with different semiconductor layer thicknesses. FETs with semiconductor layer thicknesses from 鈭?5 to 50 nm exhibit similar electron mobilities (渭鈥檚) of 0.2鈥?.45 cm2 V鈥? s鈥?. Reduction of the active film thickness led to decreased 渭 values; however, FETs with 鈭? and 鈭? nm thick P(NDI2OD-T2) films still exhibit substantial 渭鈥檚 of 0.01鈥?.02 and 鈭?0鈥? cm2 V鈥? s鈥?, respectively. Interestingly, the lowest molecular weight sample (P-23, MW 鈮?23 kg/mol, polydispersity index (PDI) = 1.9) exhibited higher 渭 than the highest molecular weight sample (P-250, MW 鈮?250 kg/mol, PDI = 2.3) measured for thicker devices (15鈥?0 nm). This is rather unusual behavior because typically charge carrier mobility increases with MW where improved grain-to-grain connectivity usually enhances transport events. We attribute this result to the high crystallinity of the lowest MW sample, as confirmed by differential scanning calorimetry and X-ray diffraction studies, which may (over)compensate for other effects.