Synchronously Achieving Plasmonic Bi Metal Deposition and I– Doping by Utilizing BiOIO3 as the Self-Sacrificing Template for High-Performance Multifunctional Applications

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• 作者：Shixin Yu ; Hongwei Huang ; Fan Dong ; Min Li ; Na Tian ; Tierui Zhang ; Yihe Zhang
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2015
• 出版时间：December 23, 2015
• 年：2015
• 卷：7
• 期：50
• 页码：27925-27933
• 全文大小：664K
• ISSN：1944-8252

文摘

Herein, we uncover simultaneously achieving plasmonic Bi metal deposition and I^– doping by employing wide-band-gap BiOIO₃ as the self-sacrificing template. It was synthesized via a facile NaBH₄-assisted in situ reduction route under ambient conditions. The reducing extent as well as photocatalytic levels can be easily modulated by controlling the concentration of NaBH₄ solution. It is interesting that the band gap of BiOIO₃ can be continuously narrowed by the modification, and the photoresponse range is drastically extended to cover the whole visible region. Bi/I^– codecorated BiOIO₃ not only exhibits profoundly upgraded photoreactivity in comparison with pristine BiOIO₃ but also shows universally strong photooxidation properties toward decomposition of multiple industrial contaminants and pharmaceutical, including phenol, 2,4-Dichlorophenol (2,4-DCP), bisphenol A (BPA), dye model Rhodamine (RhB), tetracycline hydrochloride, and gaseous NO under visible light (λ ≥ 420 nm) or simulated solar light irradiation. It also outperforms the well-known and important photocatalysts C₃N₄, BiOBr, and Bi₂WO₆ for NO removal. The cooperative effects from Bi SPR and I^– doping endow BiOIO₃ with a narrowed band gap and highly boosted separation of charge carriers, thus responsible for the outstanding catalytic activity. The present study provides an absorbing candidate for practical environmental applications and also furthers our understanding of developing high-performance photocatalysts by manipulating manifold strategies in a facile way.