Activating “Invisible” Glue: Using Electron Beam for Enhancement of Interfacial Properties of Graphene–Metal Contact

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• 作者：Songkil Kim ; Michael Russell ; Dhaval D. Kulkarni ; Mathias Henry ; Steve Kim ; Rajesh R. Naik ; Andrey A. Voevodin ; Seung Soon Jang ; Vladimir V. Tsukruk ; Andrei G. Fedorov
• 刊名：ACS Nano
• 出版年：2016
• 出版时间：January 26, 2016
• 年：2016
• 卷：10
• 期：1
• 页码：1042-1049
• 全文大小：381K
• ISSN：1936-086X

文摘

Interfacial contact of two-dimensional graphene with three-dimensional metal electrodes is crucial to engineering high-performance graphene-based nanodevices with superior performance. Here, we report on the development of a rapid “nanowelding” method for enhancing properties of interface to graphene buried under metal electrodes using a focused electron beam induced deposition (FEBID). High energy electron irradiation activates two-dimensional graphene structure by generation of structural defects at the interface to metal contacts with subsequent strong bonding via FEBID of an atomically thin graphitic interlayer formed by low energy secondary electron-assisted dissociation of entrapped hydrocarbon contaminants. Comprehensive investigation is conducted to demonstrate formation of the FEBID graphitic interlayer and its impact on contact properties of graphene devices achieved via strong electromechanical coupling at graphene–metal interfaces. Reduction of the device electrical resistance by ～50% at a Dirac point and by ～30% at the gate voltage far from the Dirac point is obtained with concurrent improvement in thermomechanical reliability of the contact interface. Importantly, the process is rapid and has an excellent insertion potential into a conventional fabrication workflow of graphene-based nanodevices through single-step postprocessing modification of interfacial properties at the buried heterogeneous contact.