Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer

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• 作者：Hyeong Min Jin ; Seung Hyun Lee ; Ju Young Kim ; Seung-Woo Son ; Bong Hoon Kim ; Hwan Keon Lee ; Jeong Ho Mun ; Seung Keun Cha ; Jun Soo Kim ; Paul F. Nealey ; Keon Jae Lee ; Sang Ouk Kim
• 刊名：ACS Nano
• 出版年：2016
• 出版时间：March 22, 2016
• 年：2016
• 卷：10
• 期：3
• 页码：3435-3442
• 全文大小：574K
• ISSN：1936-086X

文摘

Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization of silicon or oxides for display applications. Two-dimensional materials such as graphene exhibit remarkable physical properties and are under intensive development for the manufacture of flexible devices. Here we demonstrate an area-selective ultrafast nanofabrication method using low intensity infrared or visible laser irradiation to direct the self-assembly of block copolymer films into highly ordered manufacturing-relevant architectures at the scale below 12 nm. The fundamental principles underlying this light-induced nanofabrication mechanism include the self-assembly of block copolymers to proceed across the disorder–order transition under large thermal gradients, and the use of chemically modified graphene films as a flexible and conformal light-absorbing layers for transparent, nonplanar, and mechanically flexible surfaces.