Block Copolymer with an Extremely High Block-to-Block Interaction for a Significant Reduction of Line-Edge Fluctuations in Self-Assembled Patterns

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• 作者：Jong Min Kim ; Yoon Hyung Hur ; Jae Won Jeong ; Tae Won Nam ; Jung Hye Lee ; Kiung Jeon ; YongJoo Kim ; Yeon Sik Jung
• 刊名：Chemistry of Materials
• 出版年：2016
• 出版时间：August 23, 2016
• 年：2016
• 卷：28
• 期：16
• 页码：5680-5688
• 全文大小：596K
• 年卷期：0
• ISSN：1520-5002

文摘

Directed self-assembly (DSA) of block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ) provides advantages of pattern size reduction below 10 nm and improved pattern quality. Despite theoretical predictions, however, the questions of whether BCPs with a much higher χ than conventional high-χ BCPs can further improve the line edge roughness (LER) and how to overcome their extremely slow self-assembly kinetics remain unanswered. Here, we report the synthesis and assembly of poly(4vinylpyridine-b-dimethylsiloxane) BCP with an extremely high χ-parameter (estimated to be approximately 7 times higher compared to that of poly(styrene-b-dimethylsiloxane) – a conventional high-χ BCP) and achieve a markedly low 3σ line edge roughness of 0.98 nm, corresponding to 6% of its line width. Moreover, we demonstrate the successful application of an ethanol-based 60 °C warm solvent annealing treatment to address the extremely slow assembly kinetics of the extremely high-χ BCP, considerably reducing the self-assembly time from several hours to a few minutes. This study suggests that the use of BCPs with an even larger χ could be beneficial for further improvement of self-assembled BCP pattern quality.