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Scalable Patterning of MoS2 Nanoribbons by Micromolding in Capillaries
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In this study, we report a facile approach to prepare dense arrays of MoS<sub>2sub> nanoribbons by combining procedures of micromolding in capillaries (MIMIC) and thermolysis of thiosalts ((NH<sub>4sub>)<sub>2sub>MoS<sub>4sub>) as the printing ink. The obtained MoS<sub>2sub> nanoribbons had a thickness reaching as low as 3.9 nm, a width ranging from 157 to 465 nm, and a length up to 2 cm. MoS<sub>2sub> nanoribbons with an extremely high aspect ratio (length/width) of ∼7.4 × 10<sup>8sup> were achieved. The MoS<sub>2sub> pattern can be printed on versatile substrates, such as SiO<sub>2sub>/Si, sapphire, Au film, FTO/glass, and graphene-coated glass. The degree of crystallinity of the as-prepared MoS<sub>2sub> was discovered to be adjustable by varying the temperature through postannealing. The high-temperature thermolysis (1000 °C) results in high-quality conductive samples, and field-effect transistors based on the patterned MoS<sub>2sub> nanoribbons were demonstrated and characterized, where the carrier mobility was comparable to that of thin-film MoS<sub>2sub>. In contrast, the low-temperature-treated samples (170 °C) result in a unique nanocrystalline MoS<sub>xsub> structure (x ≈ 2.5), where the abundant and exposed edge sites were obtained from highly dense arrays of nanoribbon structures by this MIMIC patterning method. The patterned MoS<sub>xsub> was revealed to have superior electrocatalytic efficiency (an overpotential of ∼211 mV at 10 mA/cm<sup>2sup> and a Tafel slope of 43 mV/dec) in the hydrogen evolution reaction (HER) when compared to the thin-film MoS<sub>2sub>. The report introduces a new concept for rapidly fabricating cost-effective and high-density MoS<sub>2sub>/MoS<sub>xsub> nanostructures on versatile substrates, which may pave the way for potential applications in nanoelectronics/optoelectronics and frontier energy materials.

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