Suppression of Interfacial Current Fluctuation in MoTe2 Transistors with Different Dielectrics

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• 作者：Hyunjin Ji ; Min-Kyu Joo ; Yoojoo Yun ; Ji-Hoon Park ; Gwanmu Lee ; Byoung Hee Moon ; Hojoon Yi ; Dongseok Suh ; Seong Chu Lim
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2016
• 出版时间：July 27, 2016
• 年：2016
• 卷：8
• 期：29
• 页码：19092-19099
• 全文大小：443K
• 年卷期：0
• ISSN：1944-8252

文摘

For transition metal dichalcogenides, the fluctuation of the channel current due to charged impurities is attributed to a large surface area and a thickness of a few nanometers. To investigate current variance at the interface of transistors, we obtain the low-frequency (LF) noise features of MoTe₂ multilayer field-effect transistors with different dielectric environments. The LF noise properties are analyzed using the combined carrier mobility and carrier number fluctuation model which is additionally parametrized with an interfacial Coulomb-scattering parameter (α) that varies as a function of the accumulated carrier density (N_acc) and the location of the active channel layer of MoTe₂. Our model shows good agreement with the current power spectral density (PSD) of MoTe₂ devices from a low to high current range and indicates that the parameter α exhibits a stronger dependence on N_acc with an exponent −γ of −1.18 to approximately −1.64 for MoTe₂ devices, compared with −0.5 for Si devices. The raised Coulomb scattering of the carriers, particularly for a low-current regime, is considered to be caused by the unique traits of layered semiconductors such as interlayer coupling and the charge distribution strongly affected by the device structure under a gate bias, which completely change the charge screening effect in MoTe₂ multilayer. Comprehensive static and LF noise analyses of MoTe₂ devices with our combined model reveal that a chemical-vapor deposited h-BN monolayer underneath MoTe₂ channel and the Al₂O₃ passivation layer have a dissimilar contribution to the reduction of current fluctuation. The three-fold enhanced carrier mobility due to the h-BN is from the weakened carrier scattering at the gate dielectric interface and the additional 30% increase in carrier mobility by Al₂O₃ passivation is due to the reduced interface traps.