Facile Multiscale Patterning by Creep-Assisted Sequential Imprinting and Fuel Cell Application

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• 作者：Segeun Jang ; Minhyoung Kim ; Yun Sik Kang ; Yong Whan Choi ; Sang Moon Kim ; Yung-Eun Sung ; Mansoo Choi
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2016
• 出版时间：May 11, 2016
• 年：2016
• 卷：8
• 期：18
• 页码：11459-11465
• 全文大小：492K
• 年卷期：0
• ISSN：1944-8252

文摘

The capability of fabricating multiscale structures with desired morphology and incorporating them into engineering applications is key to realizing technological breakthroughs by employing the benefits from both microscale and nanoscale morphology simultaneously. Here, we developed a facile patterning method to fabricate multiscale hierarchical structures by a novel approach called creep-assisted sequential imprinting. In this work, nanopatterning was first carried out by thermal imprint lithography above the glass transition temperature (T_g) of a polymer film, and then followed by creep-assisted imprinting with micropatterns based on the mechanical deformation of the polymer film under the relatively long-term exposure to mechanical stress at temperatures below the T_g of the polymer. The fabricated multiscale arrays exhibited excellent pattern uniformity over large areas. To demonstrate the usage of multiscale architectures, we incorporated the multiscale Nafion films into polymer electrolyte membrane fuel cell, and this device showed more than 10% higher performance than the conventional one. The enhancement was attributed to the decrease in mass transport resistance because of unique cone-shape morphology by creep-recovery effects and the increase in interfacial surface area between Nafion film and electrocatalyst layer.