Photopatterning of Block Copolymer Thin Films

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• 作者：Austin P. Lane ; Michael J. Maher ; C. Grant Willson ; Christopher J. Ellison
• 刊名：ACS Macro Letters
• 出版年：2016
• 出版时间：April 19, 2016
• 年：2016
• 卷：5
• 期：4
• 页码：460-465
• 全文大小：410K
• 年卷期：0
• ISSN：2161-1653

文摘

Block copolymers are potentially useful materials for large-area 2-D patterning applications due to their spontaneous self-assembly into sub-50 nm domains. However, most thin film engineering applications require patterns of prescribed size, shape, and organization. Photopatterning is a logical choice for manipulating block copolymer features since advanced lithography tools can pattern areas as small as a single block copolymer domain. By exposing either the block copolymer or a responsive interfacial surface to patterned radiation, precise control over placement, orientation, alignment, and selective development of block copolymer domains can be achieved. This Viewpoint highlights some of the recent research in photopatterning block copolymer thin films and identifies areas of future opportunity.