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Low-Temperature Atomic Layer Deposition of CuSbS2 for Thin-Film Photovoltaics
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文摘
Copper antimony sulfide (CuSbS<sub>2sub>) has been gaining traction as an earth-abundant absorber for thin-film photovoltaics given its near ideal band gap for solar energy conversion (∼1.5 eV), large absorption coefficient (>10<sup>4sup> cm<sup>–1sup>), and elemental abundance. Through careful in situ analysis of the deposition conditions, a low-temperature route to CuSbS<sub>2sub> thin films via atomic layer deposition has been developed. After a short (15 min) postprocess anneal at 225 °C, the ALD-grown CuSbS<sub>2sub> films were crystalline with micron-sized grains, exhibited a band gap of 1.6 eV and an absorption coefficient >10<sup>4sup> cm<sup>–1sup>, as well as a hole concentration of 10<sup>15sup> cm<sup>–3sup>. Finally, the ALD-grown CuSbS<sub>2sub> films were paired with ALD-grown TiO<sub>2sub> to form a photovoltaic device. This photovoltaic device architecture represents one of a very limited number of Cd-free CuSbS<sub>2sub> PV device stacks reported to date, and it is the first to demonstrate an open-circuit voltage on par with CuSbS<sub>2sub>/CdS heterojunction PV devices. While far from optimized, this work demonstrates the potential for ALD-grown CuSbS<sub>2sub> thin films in environmentally benign photovoltaics.

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