The effect of γ-ray irradiation on the adsorption properties and chemical stability of AMP/SiO₂ towards Cs(I) in HNO₃ solution

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• 作者：Xiaoxia Zhang ; Yan Wu ; Baocai Chen…
• 关键词：AMP/SiO2 ; Cs(I) ; γ ; Ray absorbed doses ; Adsorption ; Chemical stability
• 刊名：Journal of Radioanalytical and Nuclear Chemistry
• 出版年：2016
• 出版时间：November 2016
• 年：2016
• 卷：310
• 期：2
• 页码：905-910
• 全文大小：557 KB
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Nuclear Chemistry
  Physical Chemistry
  Nuclear Physics, Heavy Ions and Hadrons
  Diagnostic Radiology
  Inorganic Chemistry
  
• 出版者：Akad茅miai Kiad贸, co-published with Springer Science+Business Media B.V., Formerly Kluwer Academic
• ISSN：1588-2780
• 卷排序：310

文摘

Silica based ammonium molybdophosphate (AMP/SiO₂) adsorbent was used to remove Cs(I) from HNO₃ solution. The adsorbent with different absorbed dose (0–300 kGy) was characteristed by X-ray power diffraction. The adsorption data against different γ-ray absorbed doses were analyzed by the Langmuir isotherm. The adsorption capacity decreased slightly from 23.22 to 22.37 mg/g with the increase of the absorbed dose. The breakthrough properties of Cs(I) were conducted using column packed with AMP/SiO₂ before and after irradiation. The chemical stability of AMP/SiO₂ at 300 kGy absorbed dose in 3 mol/L (M) HNO₃ was excellent.