Thermodynamic Estimation of Silicon Tetrachloride to Trichlorosilane by a Low Temperature Hydrogenation Technique

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• 作者：Jijun Wu ; Zhengjie Chen ; Wenhui Ma ; Yongnian Dai
• 关键词：Silicon tetrachloride ; Trichlorosilane ; Hydrogenation ; Thermodynamics ; Conversion ratio
• 刊名：SILICON
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：9
• 期：1
• 页码：69-75
• 全文大小：1,463 KB
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Inorganic Chemistry
  Materials Science
  Organic Chemistry
  Polymer Sciences
  Biomedical Engineering
  Nanotechnology
  
• 出版者：Springer Netherlands
• ISSN：1876-9918
• 卷排序：9

文摘

The chemical reactions in the SiCl₄-Si-H₂ system using a low temperature hydrogenation technique related to the Siemens process were studied based on thermodynamics. The diagrams of standard Gibbs free energy of formation and equilibrium constants for seven reactions used as a function of temperature in this system were calculated and plotted for a temperature range of 473 K to 1073 K. It showed that the lower the temperature, the larger the conversion ratio of SiCl₄. The equilibrium composition of gaseous species in the SiCl₄-Si-H₂ system with different initial SiCl₄/H₂ ratio and systematic pressure was calculated and the corresponding conversion ratio of SiCl₄ was obtained. The conversion ratio was improved by increasing the initial ratio of H₂ in raw materials and the systematic pressure but was reduced with the increase of temperature. The conversion ratio of SiCl₄ reached 0.41 with an initial SiCl₄/H₂ ratio of 1/5 and a systematic pressure of 5 MPa at 473 K.