Surface Damage Mechanism of Monocrystalline Si Under Mechanical Loading

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• 作者：Qingliang Zhao ; Quanli Zhang ; Suet To ; Bing Guo
• 关键词：Contact loading ; ductile–brittle transition ; oxidation ; fracture ; phase transformation
• 刊名：Journal of Electronic Materials
• 出版年：2017
• 出版时间：March 2017
• 年：2017
• 卷：46
• 期：3
• 页码：1862-1868
• 全文大小：
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Optical and Electronic Materials; Characterization and Evaluation of Materials; Electronics and Microelectronics, Instrumentation; Solid State Physics;
• 出版者：Springer US
• ISSN：1543-186X
• 卷排序：46

文摘

Single-point diamond scratching and nanoindentation on monocrystalline silicon wafer were performed to investigate the surface damage mechanism of Si under the contact loading. The results showed that three typical stages of material removal appeared during dynamic scratching, and a chemical reaction of Si with the diamond indenter and oxygen occurred under the high temperature. In addition, the Raman spectra of the various points in the scratching groove indicated that the Si-I to β-Sn structure (Si-II) and the following β-Sn structure (Si-II) to amorphous Si transformation appeared under the rapid loading/unloading condition of the diamond grit, and the volume change induced by the phase transformation resulted in a critical depth (ductile–brittle transition) of cut (∼60 nm ± 15 nm) much lower than the theoretical calculated results (∼387 nm). Moreover, it also led to abnormal load–displacement curves in the nanoindentation tests, resulting in the appearance of elbow and pop-out effects (∼270 nm at 20 s, 50 mN), which were highly dependent on the loading/unloading conditions. In summary, phase transformation of Si promoted surface deformation and fracture under both static and dynamic mechanical loading.